This release supports Windows XP and Windows 2000. Nexaweb Studio is based on Eclipse 3.2.1 - which does not support Windows Vista - therefore this release does not support Windows Vista.
Welcome Page Changes
Nexaweb Studio can now be installed into existing Eclipse-based environments via a new update site (http://dev.nexaweb.com/update). This includes:
For more information see the installation instructions page.
The properties view has been changed to leverage the tabbed property view to make access of properties faster and more intuitive.
A rich macro builder has been added that allows creation and management of complex macros, exposing all macro functionality available to the user in a clear and usable fashion.
XPath expressions are an important part of building Nexaweb applications especially Macros and Data
Further feature enhancements have been made:
Previous data workflow consisted of single dialog interfaces for configuring the attributes of a data tag. In Studio 4.0 new workflow has been added that guides the user through common actions and provides clear paths to connect data and user interface together.
New workflow:
Additionally, these workflows have been linked together, and linked to other workflow, so that combined with clear descriptions of each step users should be able to quickly and easily add data to their application.
To better support the Data workflows, the data view has been improved to bring its utility on par with the Outline View.
The existing add event workflow has been expanded to include additional operations that were available but not obvious to users.
Additionally, these are configured on a per Platform basis, allowing extension of the exposed functionality in future platform releases without requiring a new version of Studio.
Data Service Workflow
New workflow provides a wizard approach to building service requests, hooks in with the other data workflow and fixes some existing issues with building service requests in Studio.
Several features once hard coded into a particular version of the Studio have been moved into the Platform:
Some additional enhancements have also been added based on the usability results:
For the "all in one" installer the following components have been upgraded:
與Eclipse Platform類似,Eclipse GEF通過(guò)大量使用設(shè)計(jì)模式來(lái)得到它的靈活性和擴(kuò)展性。下面總結(jié)以下經(jīng)常碰到的模式的小結(jié)。
1. MVC
與其他圖形框架類似,GEF使用MVC來(lái)消除UI之間的耦合。
(1)Model:可以用任何Java對(duì)象來(lái)表示,model必須擁有某種notification機(jī)制。
(2)Views: Figure/TreeItems, 在典型的GraphicalEditor中,F(xiàn)igure是用于在GraphicalViewer中顯示的Draw2D Figure,而TreeItems用于在Outline中的TreeViewer中顯示信息。
(3)Controller(EditPart):通常對(duì)于每個(gè)Figure對(duì)應(yīng)一個(gè)EditPart,EditPart用于修改,很多修改任務(wù)都是通過(guò)EditPolicy來(lái)實(shí)現(xiàn)的。
2.Command
Command封裝了Model的修改,可以通過(guò)繼承GEF中的抽象類Command,提供可Redo/Undo功能,我們主要是在execute()/redo()/undo()中完成業(yè)務(wù)功能的實(shí)現(xiàn)。
3. Chain of Responsibility
Chain of Responsibility通過(guò)將Request傳遞給多個(gè)對(duì)象,并給這些對(duì)象機(jī)會(huì)處理請(qǐng)求,從而將請(qǐng)求的發(fā)送者和接受者解除耦合。在GEF中,多個(gè)EditPolicy可以收到請(qǐng)求,返回Commands,這些Commands以鏈的方式組織在一起。
4. State
允許Graphical Editor在內(nèi)部狀態(tài)發(fā)生改變的時(shí)候,修改編輯器的行為。對(duì)于GEF Editor,用戶切換工具可以改變編輯器的狀態(tài)。例如,對(duì)于鼠標(biāo)按下事件,編輯器在激活選區(qū)工具和激活創(chuàng)建工具下的行為是截然不同的。詳細(xì)請(qǐng)見(jiàn)org.eclipse.gef.Tool接口,AbstractTool定義了幾個(gè)state,STATE_xxx.
5. Abstract Factory
提供Interface創(chuàng)建一系列相關(guān)或相依賴的對(duì)象。這個(gè)模式在根據(jù)模型部件創(chuàng)建編輯部件時(shí)被使用。
6. Factory Method
定義了方法創(chuàng)建對(duì)象,但是允許子類決定實(shí)例化的類。這個(gè)模式?jīng)]有被單獨(dú)討論,但是它是創(chuàng)建編輯部件的另一種可選的方法。createChild方法允許你不使用工廠就創(chuàng)建子編輯部件。
Override是norm,而Overroad是Exception
Override是在Runtime時(shí)候判斷的,而Overload是在Compile-Time時(shí)候判斷的
對(duì)于Constructor,只能Overload,而不能Override
盡量少用Overroad,就算用了也盡量使用不同數(shù)目的參數(shù),以免client混淆。